Doping of Amorphous and Microcrystalline Silicon Films Deposited at Low Substrate Temperatures by Hot-Wire Chemical Vapor Deposition

AuthID
 P-000-TFK
3
Author(s)
·
Tipo de Documento
Article
Year published
2001
Publicado
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, ISSN: 0734-2101
Volume: 19, Número: 5, Páginas: 2328-2334 (7)
Indexing
Wos®
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-0035440997
Wos: WOS:000171376700046
Source Identifiers
ISSN: 0734-2101
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2024 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service