Annealing Effect of Magnetic Tunnel Junctions with One Feox Layer Inserted at the Al2O3/Cofe Interface

AuthID
 P-000-VHN
6
Author(s)
Zhang, ZZ
·
Wei, P
·
Tipo de Documento
Article
Year published
2001
Publicado
in APPLIED PHYSICS LETTERS, ISSN: 0003-6951
Volume: 78, Número: 19, Páginas: 2911-2913 (3)
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Publication Identifiers
SCOPUS: 2-s2.0-0035820768
Wos: WOS:000168437600032
Source Identifiers
ISSN: 0003-6951
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