A New Omcvd Iridium Precursor for Thin Film Deposition

AuthID
P-000-W6R
6
Author(s)
Serp, P
·
Feurer, R
·
Kalck, P
·
Tipo de Documento
Article
Year published
2001
Publicado
in CHEMICAL VAPOR DEPOSITION, ISSN: 0948-1907
Volume: 7, Número: 2, Páginas: 59-62 (4)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-0003072387
Wos: WOS:000167699300001
Source Identifiers
ISSN: 0948-1907
Export Publication Metadata
Info
At this moment we don't have any links to full text documens.