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Influence of the Process Parameters on Structural and Electrical Properties of R.f. Magnetron Sputtering Ito Films

AuthID
P-000-WD3

Author(s)

Baia, I

Fernandes, B

Nunes, P

Quintela, M

Martins, R

Tipo de Documento

Article

Year published

2001

Publicado

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 383, Número: 1-2, Páginas: 244-247 (4)

Conference

3Rd Symposium O on Thin Film Materials for Large Area Electronics of the E-Mrs 2000 Spring Meeting, Date: MAY 30-JUN 02, 2000, Location: STRASBOURG, FRANCE, Patrocinadores: French Minist Res, Balzers AG, Unaxis, Jobin Yvon

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Publication Identifiers

DOI: 10.1016/s0040-6090(00)01589-3

SCOPUS: 2-s2.0-2942746184

Wos: WOS:000167378300061

Source Identifiers

ISSN: 0040-6090

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Influence of the Process Parameters on Structural and Electrical Properties of R.f. Magnetron Sputtering Ito Films

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Influence of the Process Parameters on Structural and Electrical Properties of R.f. Magnetron Sputtering Ito Films

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