A New Method to Build a High-Voltage Pulse Supply Using Only Semiconductor Switches for Plasma-Immersion Ion Implantation

AuthID
 P-000-WDS
3
Author(s)
Tipo de Documento
Article
Year published
2001
Publicado
in SURFACE & COATINGS TECHNOLOGY, ISSN: 0257-8972
Volume: 136, Número: 1-3, Páginas: 51-54 (4)
Conference
5Th International Workshop on Plasma-Based Ion Implantation (Pbii-99), Date: DEC 13-16, 1999, Location: SEIKA, JAPAN, Patrocinadores: Sci & Technol Agcy, Japan Int Sci & Technol Exchange Ctr, Osaka Natl Res Inst
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Publication Identifiers
SCOPUS: 2-s2.0-0035253905
Wos: WOS:000166464900012
Source Identifiers
ISSN: 0257-8972
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