Lattice Location and Stability of Ion Implanted Cu in Si

AuthID
 P-008-X9V
4
Author(s)
Vantomme, A
·
Langouche, G
·
1
Group Author(s)
ISOLDE Collaboration
Tipo de Documento
Article
Year published
2000
Publicado
in PHYSICAL REVIEW LETTERS, ISSN: 0031-9007
Volume: 84, Número: 7, Páginas: 1495-1498 (4)
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Publication Identifiers
SCOPUS: 2-s2.0-0000873237
Wos: WOS:000085267100034
Source Identifiers
ISSN: 0031-9007
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