Publicações

Lattice Sites and Damage Annealing of Implanted Tm and Er in Si

AuthID
P-008-XA0

Author(s)

Wahl, U

Correia, JG

De Wachter, J

Langouche, G

Marques, JG

Moons, R

Vantomme, A

Group Author(s)

ISOLDE Collaboration

Editor(es)

delaRubia,TD;Coffa,S;Stolk,PA;Rafferty,CS

Tipo de Documento

Proceedings Paper

Year published

1997

Publicado

in DEFECTS AND DIFFUSION IN SILICON PROCESSING in MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, ISSN: 0272-9172

Volume: 469, Páginas: 407-412 (6)

Conference

Symposium on Defects and Diffusion in Silicon Processing, Date: APR 01-04, 1997, Location: SAN FRANCISCO, CA, Patrocinadores: Mat Res Soc, Bell Labs, Lucent Technol, CNR, Lawrence Livermore Natl Lab, Philips Res Labs, SEMATECH, SGS Thomson Microelectr, Technol Modelling Associates

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