Deposition Of Amorphous-Silicon Using A Tubular Reactor With Concentric-Electrode Confinement

AuthID
 P-008-XMW
5
Author(s)
CHAN, KK
·
BLUM, JM
·
ARIENZO, M
·
CUOMO, JJ
Tipo de Documento
Article
Year published
1992
Publicado
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 71, Número: 8, Páginas: 3981-3989 (9)
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Publication Identifiers
SCOPUS: 2-s2.0-0041150150
Wos: WOS:A1992HP36600050
Source Identifiers
ISSN: 0021-8979
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