The Effect Of The Flow Of Silane On The Properties Of A-Si-H Deposited By Concentric-Electrode Radio-Frequency Glow-Discharge

AuthID
 P-008-XMX
4
Author(s)
CHAN, KK
·
BLUM, JM
·
ARIENZO, M
Tipo de Documento
Article
Year published
1992
Publicado
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 71, Número: 8, Páginas: 3991-3996 (6)
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Publication Identifiers
SCOPUS: 2-s2.0-0008150358
Wos: WOS:A1992HP36600051
Source Identifiers
ISSN: 0021-8979
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