Epitaxial Growth of Β-Fesi2 on Silicon (111): a Real-Time Rheed Analysis

AuthID
P-009-57P
4
Author(s)
Le Thanh, V
·
Derrien, J
Tipo de Documento
Article
Year published
1992
Publicado
in Applied Surface Science, ISSN: 0169-4332
Volume: 56-58, Número: PART 1, Páginas: 438-443
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Publication Identifiers
SCOPUS: 2-s2.0-0038436906
Source Identifiers
ISSN: 0169-4332
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