The Influence of Substrate Temperature and Al Mobility on the Microstructural Evolution of Magnetron Sputtered Ternary Ti-Al-N Thin Films

AuthID
P-009-EZC
7
Author(s)
Beckers, M
·
Hoglund, C
·
Baehtz, C
·
Persson, POA
·
Hultman, L
·
Moeller, W
Tipo de Documento
Article
Year published
2009
Publicado
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 106, Número: 6, Páginas: 064915 (7)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-70349823227
Wos: WOS:000270378100167
Source Identifiers
ISSN: 0021-8979
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