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Influence of the Target-Substrate Distance on the Properties of Indium Tin Oxide Films Prepared by Radio Frequency Reactive Magnetron Sputtering

AuthID
P-000-ZNJ

Author(s)

Meng, LJ

dos Santos, MP

Tipo de Documento

Article

Year published

2000

Publicado

in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, ISSN: 0734-2101

Volume: 18, Número: 4, Páginas: 1668-1671 (4)

Conference

46Th National Symposium of the American-Vacuum-Society, Date: OCT 25-29, 1999, Location: SEATTLE, WASHINGTON, Patrocinadores: Amer Vacuum Soc

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Publication Identifiers

DOI: 10.1116/1.582404

SCOPUS: 2-s2.0-0034227044

Wos: WOS:000088277000025

Source Identifiers

ISSN: 0734-2101

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Influence of the Target-Substrate Distance on the Properties of Indium Tin Oxide Films Prepared by Radio Frequency Reactive Magnetron Sputtering

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Influence of the Target-Substrate Distance on the Properties of Indium Tin Oxide Films Prepared by Radio Frequency Reactive Magnetron Sputtering

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