Low Substrate Temperature Deposition of Amorphous and Microcrystalline Silicon Films on Plastic Substrates by Hot-Wire Chemical Vapor Deposition

AuthID
P-001-076
3
Author(s)
Tipo de Documento
Article
Year published
2000
Publicado
in JOURNAL OF NON-CRYSTALLINE SOLIDS, ISSN: 0022-3093
Volume: 266, Páginas: 110-114 (5)
Conference
18Th International Conference on Amorphous and Microcrystalline Semiconductors (Icams 18), Date: AUG 23-27, 1999, Location: SNOWBIRD, UT, Patrocinadores: Energy Convers Devices, Japan Steelworks Ltd, MVSystems Inc, Natl Renewable Energy Lab, Princeton Univ, Sanyo Elect Corp, Sony Corp, Syracuse Univ, United Solar Syst Corp, Univ Utah, Xerox Corp
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-0347741325
Wos: WOS:000087189800019
Source Identifiers
ISSN: 0022-3093
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