Publicações

Influence of Oxygen Ion Implantation on the Damage and Annealing Kinetics of Iron-Implanted Sapphire

AuthID
P-001-08J

Author(s)

McHargue, CJ

Hunn, JD

Alves, E

da Silva, MF

Soares, JC

Tipo de Documento

Article

Year published

2000

Publicado

in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, ISSN: 0168-583X

Volume: 166, Páginas: 188-192 (5)

Conference

10Th International Conference on Radioation Effects in Insulators (Rei-10), Date: JUL 18-23, 1999, Location: JENA, GERMANY, Patrocinadores: Deutsch Forsch Gemeinsch, Friedrich Schiller Univ Jena, Thruinger Minist Wissensch, Forsch & Kultur, Elsevier Sci BV, Amsterdam, High Voltage Engn Europa BV, Amersfoort, Carl Zeiss Jena GmbH, Jena, Jenoptik AG, Jena, Layertec GmbH, Mellingen, VACOM GmbH, Jena, JENION, Jena, PINK GmbH, Wertheim

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