Electrodeposition of Copper Thin Films from 1-Ethyl-3-Methylimidazolium Bis(Trifluoromethylsulfonyl)Imide

AuthID
 P-00A-3AJ
5
Author(s)
Liu, TM
·
Vilar, R
·
Grondin, J
·
Danten, Y
Tipo de Documento
Article
Year published
2015
Publicado
in JOURNAL OF APPLIED ELECTROCHEMISTRY, ISSN: 0021-891X
Volume: 45, Número: 1, Páginas: 87-93 (7)
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Publication Identifiers
SCOPUS: 2-s2.0-84925463308
Wos: WOS:000347029900010
Source Identifiers
ISSN: 0021-891X
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