Characterisation of Zro2 Films Prepared by Rf Reactive Sputtering at Different O-2 Concentrations in the Sputtering Gases

AuthID
 P-001-104
5
Author(s)
Gao, PT
·
Tipo de Documento
Article
Year published
2000
Publicado
in VACUUM, ISSN: 0042-207X
Volume: 56, Número: 2, Páginas: 143-148 (6)
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Publication Identifiers
SCOPUS: 2-s2.0-0033891496
Wos: WOS:000085619100009
Source Identifiers
ISSN: 0042-207X
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