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Role of the Gas Temperature and Power to Gas Flow Ratio on Powder and Voids Formation in Films Grown by Pecvd Technique

AuthID
P-001-29N

Author(s)

Martins, R

Silva, V

Ferreira, I

Domingues, A

Fortunato, E

Tipo de Documento

Article

Year published

2000

Publicado

in VACUUM, ISSN: 0042-207X

Volume: 56, Número: 1, Páginas: 25-30 (6)

Conference

Symposium D - Measurement Techniques for Technological Plasmas at the 1999 E-Mrs Spring Meeting, Date: JUN 01-02, 1999, Location: STRASBOURG, FRANCE, Patrocinadores: Plasma & Ion Surface Engn Comm

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Publication Identifiers

DOI: 10.1016/s0042-207x(99)00158-x

SCOPUS: 2-s2.0-0033886444

Wos: WOS:000085217600005

Source Identifiers

ISSN: 0042-207X

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Role of the Gas Temperature and Power to Gas Flow Ratio on Powder and Voids Formation in Films Grown by Pecvd Technique

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Role of the Gas Temperature and Power to Gas Flow Ratio on Powder and Voids Formation in Films Grown by Pecvd Technique

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