Amorphous and Microcrystalline Silicon Films Grown at Low Temperatures by Radio-Frequency and Hot-Wire Chemical Vapor Deposition

AuthID
 P-001-36W
3
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·
Tipo de Documento
Article
Year published
1999
Publicado
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 86, Número: 7, Páginas: 3812-3821 (10)
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Publication Identifiers
SCOPUS: 2-s2.0-0032620083
Wos: WOS:000082652400052
Source Identifiers
ISSN: 0021-8979
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