Publicações

Dependence of Tunneling Magnetoresistance on Ferromagnetic Electrode Thickness and on the Thickness of a Cu Layer Inserted at the Al2O3/Cofe Interface

AuthID
P-001-4KT

Author(s)

Sun, JJ

Freitas, PP

Tipo de Documento

Article

Year published

1999

Publicado

in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979

Volume: 85, Número: 8, Páginas: 5264-5266 (3)

Conference

43Rd Annual Conference on Magnetism and Magnetic Materials, Date: NOV 09-12, 1998, Location: MIAMI, FL, Patrocinadores: Amer Inst Phys, IEEE Magnet Soc, Minerals Met Mat Soc, Amer Soc Testing & Mat, Amer Ceramic Soc, Amer Phys Soc, EMTEC Magnet GmbH, Fuji Photo Film Co Ltd, IBM, Imation, Sony corp, TDK Corp, Toda Kogyo Corp, ADE Technol Inc, digital Measurement Syst Div, Komag, MMC Technol Inc

Indexing