Optoelectronic and Structural Properties of Amorphous Silicon-Carbon Alloys Deposited by Low-Power Electron-Cyclotron Resonance Plasma-Enhanced Chemical-Vapor Deposition

AuthID
 P-001-4VD
11
Author(s)
·
da Silva, MF
·
Dai, Z
·
Giorgis, F
·
Pirri, CF
Tipo de Documento
Article
Year published
1999
Publicado
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 85, Número: 6, Páginas: 3327-3338 (12)
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Publication Identifiers
SCOPUS: 2-s2.0-0000973683
Wos: WOS:000079021200048
Source Identifiers
ISSN: 0021-8979
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