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Photodefined Etching of N+ Layers Diffused on P-Type Silicon Substrates

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P-001-5C4

Author(s)

Videira, RS

Tipo de Documento

Article

Year published

1999

Publicado

in APPLIED SURFACE SCIENCE, ISSN: 0169-4332

Volume: 138, Número: 1-4, Páginas: 29-34 (6)

Conference

Symposium on Surface Processing - Laser, Lamp, Plasma, at the Annual Spring Meeting of the European-Materials-Society (E-Mrs 96), Date: JUN 16-19, 1996-1998, Location: STRASBOURG, FRANCE, Patrocinadores: European Mat Soc

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Publication Identifiers

DOI: 10.1016/s0169-4332(98)00595-9

SCOPUS: 2-s2.0-0346552908

Wos: WOS:000078576400007

Source Identifiers

ISSN: 0169-4332

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Photodefined Etching of N+ Layers Diffused on P-Type Silicon Substrates

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Photodefined Etching of N+ Layers Diffused on P-Type Silicon Substrates

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