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Effect of Crystal Orientation on Damage Accumulation and Post-Implantation Annealing for Iron Implantation into Sapphire

AuthID
P-001-623

Author(s)

McHargue, CJ

Alves, E

da Silva, MF

Soares, JC

Tipo de Documento

Article

Year published

1999

Publicado

in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, ISSN: 0168-583X

Volume: 148, Número: 1-4, Páginas: 730-734 (5)

Conference

11Th International Conference on Ion Beam Modification of Materials (Ibmm98), Date: AUG 31-SEP 04, 1998, Location: AMSTERDAM, NETHERLANDS, Host: ROYAL TROP INST

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Publication Identifiers

DOI: 10.1016/s0168-583x(98)00873-8

SCOPUS: 2-s2.0-0033513826

Wos: WOS:000078575700137

Source Identifiers

ISSN: 0168-583X

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Effect of Crystal Orientation on Damage Accumulation and Post-Implantation Annealing for Iron Implantation into Sapphire

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Effect of Crystal Orientation on Damage Accumulation and Post-Implantation Annealing for Iron Implantation into Sapphire

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