Deep, Vertical Etching of Flame Hydrolysis Deposited Hi-Silica Glass Films for Optoelectronic and Bioelectronic Applications

AuthID
 P-001-7KQ
7
Author(s)
Bonar, JR
·
Jubber, MG
·
Hicks, SE
·
Wilkinson, CDW
·
Tipo de Documento
Article
Year published
1998
Publicado
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, ISSN: 1071-1023
Volume: 16, Número: 4, Páginas: 1860-1863 (4)
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Publication Identifiers
SCOPUS: 2-s2.0-0037924105
Wos: WOS:000075381400015
Source Identifiers
ISSN: 1071-1023
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