Effect of Substrate Temperature on the Properties of Ruo2 Films Prepared by Rf Reactive Magnetron Sputtering

AuthID
P-001-8KW
4
Author(s)
Tipo de Documento
Article
Year published
1998
Publicado
in JOURNAL OF THE KOREAN PHYSICAL SOCIETY, ISSN: 0374-4884
Volume: 32, Número: 4 SUPPL., Páginas: S1835-S1838 (4)
Conference
9Th International Meeting on Ferroelectricity (Imf-9), Date: AUG 25-29, 1997, Location: SEOUL, SOUTH KOREA
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-0032361550
Wos: WOS:000072212400157
Source Identifiers
ISSN: 0374-4884
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