Study of the Effect of the Oxygen Partial Pressure on the Properties of Rf Reactive Magnetron Sputtered Tin-Doped Indium Oxide Films

AuthID
 P-001-A5V
2
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Tipo de Documento
Article
Year published
1997
Publicado
in APPLIED SURFACE SCIENCE, ISSN: 0169-4332
Volume: 120, Número: 3-4, Páginas: 243-249 (7)
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Publication Identifiers
SCOPUS: 2-s2.0-0031386912
Wos: WOS:000071323000008
Source Identifiers
ISSN: 0169-4332
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