Doping of Amorphous and Microcrystalline Silicon Films Deposited by Hot-Wire Chemical Vapor Deposition Using Phosphine and Trimethylboron

AuthID
 P-001-AD3
4
Author(s)
·
Tipo de Documento
Article
Year published
1997
Publicado
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, ISSN: 0734-2101
Volume: 15, Número: 6, Páginas: 2968-2982 (15)
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Scopus®
Crossref®27
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Publication Identifiers
SCOPUS: 2-s2.0-0031501714
Wos: WOS:A1997YG05800021
Source Identifiers
ISSN: 0734-2101
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