Role of the Deposition Parameters in the Uniformity of Films Produced by the Plasma-Enhanced Chemical Vapour Deposition Technique

AuthID
 P-001-AV8
5
Author(s)
Macarico, A
·
Fidalgo, J
·
Tipo de Documento
Article
Year published
1997
Publicado
in PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, ISSN: 0141-8637
Volume: 76, Número: 3, Páginas: 259-272 (14)
Indexing
Wos®
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-0342478341
Wos: WOS:A1997XU82700003
Source Identifiers
ISSN: 0141-8637
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2024 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service