Publicações

Short Pulse Plasma Immersion Ion Implantation of Oxygen into Silicon: Determination of the Energy Distribution

AuthID
P-001-AVT

Author(s)

Barradas, NP

Maas, AJH

Mandl, S

Gunzel, R

Tipo de Documento

Article

Year published

1997

Publicado

in SURFACE & COATINGS TECHNOLOGY, ISSN: 0257-8972

Volume: 93, Número: 2-3, Páginas: 238-241 (4)

Conference

3Rd International Workshop on Plasma-Based Ion Implantation, Date: SEP 15-18, 1996, Location: DRESDEN, GERMANY, Patrocinadores: Res Ctr Rossendorf, Dresden, State Saxony, Saxonian Minist Sci & Arts, Dresden, AP & T Adv Prod & Technol GmbH, Nurtingen, Germany, DANFYSIK, Jyllinge, Denmark, Hiden Anal, Ried, Germany, Leybold Serv GmbH, Dresden, N Star Res Corp, Albuquerque, NM, Roth & Rau Oberfiachentech GmbH, Wustenbrand, Germany, SASKIA Hochvakuum GmbH, Ilmenau, Germany, SENTECH, Berlin

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