Role of the Gas Flow Parameters on the Uniformity of Films Produced by Pecvd Technique

AuthID
P-001-C5M
4
Author(s)
Macarico, A
·
5
Editor(es)
Wagner, S; Hack, M; Schiff, EA; Schropp, R; Shimizu, I
Tipo de Documento
Proceedings Paper
Year published
1997
Publicado
in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997 in MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, ISSN: 0272-9172
Volume: 467, Páginas: 609-614 (6)
Conference
Symposium on Amorphous and Microcrystalline Silicon Technology, Date: MAR 31-APR 04, 1997, Location: SAN FRANCISCO, CA, Patrocinadores: Mat Res Soc, Canon Corp, dpiX, A Xerox Co, Elect Power Res Inst, Fuji Elect Corp Res, Mitsui Toatsu Chem, MV Syst Inc, NAPS France, UNI SOLAR, Sanyo Elect Co, Sharp Ccorp, Solarex Crp, Voltaix Inc
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-0031351337
Wos: WOS:000071462000091
Source Identifiers
ISSN: 0272-9172
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