Amorphous and Microcrystalline Silicon Deposited by Low-Power Electron-Cyclotron Resonance Plasma-Enhanced Chemical-Vapor Deposition

AuthID
 P-001-CN0
6
Author(s)
Schotten, V
·
Tipo de Documento
Article
Year published
1997
Publicado
in JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, ISSN: 0021-4922
Volume: 36, Número: 1A, Páginas: 38-49 (12)
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Publication Identifiers
SCOPUS: 2-s2.0-0030684964
Wos: WOS:A1997WG05600008
Source Identifiers
ISSN: 0021-4922
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