Amorphous and Microcrystalline Silicon Films Deposited by Hot-Wire Chemical Vapor Deposition at Filament Temperatures Between 1500 and 1900 Degrees C

AuthID
 P-001-E71
4
Author(s)
Tipo de Documento
Article
Year published
1996
Publicado
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 79, Número: 11, Páginas: 8748-8760 (13)
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Publication Identifiers
SCOPUS: 2-s2.0-0000593189
Wos: WOS:A1996UN85200096
Source Identifiers
ISSN: 0021-8979
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