The Influence of Hydrogen Dilution and Substrate Temperature in Hot-Wire Deposition of Amorphous and Microcrystalline Silicon with Filament Temperatures Between 1900 and 2500 Degrees C
Hack, M; Schiff, EA; Wagner, S; Schropp, R; Matsuda, A
Tipo de Documento
Proceedings Paper
Year published
1996
Publicado
in AMORPHOUS SILICON TECHNOLOGY - 1996 in Materials Research Society Symposium Proceedings, ISSN: 0272-9172
Volume: 420, Páginas: 357-362 (6)
Conference
14Th Symposium on Amorphous Silicon Technology, at the 1996 Mrs Spring Meeting, Date: APR 08-12, 1996, Location: SAN FRANCISCO, CA, Patrocinadores: Mat Res Soc
