Temperature Dependence and Annealing Behaviour of Hf Implanted (100)Si: Hfsi2 Synthesis

AuthID
 P-001-FMJ
10
Author(s)
DaSilva, MR
·
Melo, AA
·
DaSilva, MF
·
Moons, R
·
Langouche, G
·
Vantomme, A
·
Lu, YC
·
Kung, H
4
Editor(es)
Tung, RT; Maex, K; Pellegrini, PW; Allen, LH
Tipo de Documento
Proceedings Paper
Year published
1996
Publicado
in SILICIDE THIN FILMS - FABRICATION, PROPERTIES, AND APPLICATIONS in MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, ISSN: 0272-9172
Volume: 402, Páginas: 593-597 (5)
Conference
Symposium on Silicide Thin Films - Fabrication, Properties, and Applications, at the 1995 Mrs Fall Meeting, Date: NOV 27-30, 1995, Location: BOSTON, MA, Patrocinadores: Mat Res Soc
Indexing
Wos®
Scopus®
Publication Identifiers
SCOPUS: 2-s2.0-0029754991
Wos: WOS:A1996BF20H00086
Source Identifiers
ISSN: 0272-9172
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