Deposition and Properties of Titanium Nitride Films Produced by Dc Reactive Magnetron Sputtering

AuthID
 P-001-H8Z
3
Author(s)
AZEVEDO, A
·
Tipo de Documento
Article
Year published
1995
Publicado
in VACUUM, ISSN: 0042-207X
Volume: 46, Número: 3, Páginas: 233-239 (7)
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Publication Identifiers
SCOPUS: 2-s2.0-0029276099
Wos: WOS:A1995QF11300006
Source Identifiers
ISSN: 0042-207X
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