Study of the Effect of Different Plasma-Enhanced Chemical Vapour Deposition Reactor Configurations on the Properties of Hydrogenated Amorphous Silicon Thin Films

AuthID
 P-00F-GV9
5
Author(s)
1
Editor(es)
Giorgis F.Pirri C.F.
Tipo de Documento
Proceedings Paper
Year published
2000
Publicado
in Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, ISSN: 1364-2812
Volume: 80, Número: 4, Páginas: 475-486
Conference
International Workshop on Semiconducting and Superconducting Materials, Date: 1 February 1999 through 1 February 1999, Location: Torino
Indexing
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Publication Identifiers
SCOPUS: 2-s2.0-0034175284
Source Identifiers
ISSN: 1364-2812
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