Properties of Nano-Crystalline N-Type Silicon Films Produced by Hot Wire Plasma Assisted Technique

AuthID
 P-00F-GWR
5
Author(s)
1
Editor(es)
Stutzmann MBoyce JCohen J DCollins RHanna J
Tipo de Documento
Proceedings Paper
Year published
2001
Publicado
in Materials Research Society Symposium - Proceedings, ISSN: 0272-9172
Volume: 664, Páginas: A761-A766
Conference
Amorphous and Heterogeneous Silicon Based Films 2001, Date: 16 April 2001 through 20 April 2001, Location: San Francisco, CA
Indexing
Scopus®
Publication Identifiers
SCOPUS: 2-s2.0-0035556743
Source Identifiers
ISSN: 0272-9172
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