Properties and Stability of Hydrogenated Amorphous Silicon Films with a Low Hydrogen Content Prepared by Cyclic Chemical Vapour Deposition and Hydrogenation

AuthID
 P-00F-N3K
4
Author(s)
Fischer, T
·
Schorer, R
Tipo de Documento
Article
Year published
1993
Publicado
in Materials Science and Engineering B, ISSN: 0921-5107
Volume: 17, Número: 1-3, Páginas: 82-86
Indexing
Scopus®
Publication Identifiers
SCOPUS: 2-s2.0-0027544832
Source Identifiers
ISSN: 0921-5107
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