Closed-Chamber Chemical Vapor Deposition: New Cyclic Method for Preparation of Microcrystalline Silicon Films

AuthID
 P-00F-N82
5
Author(s)
Fischer, T
·
Grebner, S
·
Muender, H
Tipo de Documento
Article
Year published
1994
Publicado
in Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, ISSN: 0021-4922
Volume: 33, Número: 8, Páginas: 4534-4539
Indexing
Scopus®
Publication Identifiers
SCOPUS: 2-s2.0-0028480298
Source Identifiers
ISSN: 0021-4922
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