An in Situ Ellipsometry Study of Amorphous Silicon/Amorphous Germanium Multilayers

AuthID
 P-00F-QAQ
3
Author(s)
Fang, M
·
Drevillon, B
Tipo de Documento
Article
Year published
1991
Publicado
in Journal of Applied Physics, ISSN: 0021-8979
Volume: 69, Número: 1, Páginas: 13-18
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Publication Identifiers
SCOPUS: 2-s2.0-0040143348
Source Identifiers
ISSN: 0021-8979
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