Influence of the Target and Working Gas on the Composition of Silicon Nitride Thin Films Prepared by Reactive Rf-Sputtering

AuthID
 P-00F-QCP
4
Author(s)
Prieto, C
·
Garcia Lopez, J
·
Respaldiza, MA
Tipo de Documento
Article
Year published
2003
Publicado
in Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, ISSN: 0168-583X
Volume: 211, Número: 2, Páginas: 199-205
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Publication Identifiers
SCOPUS: 2-s2.0-0042283074
Source Identifiers
ISSN: 0168-583X
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