Effect of Sputtering Rate and Ion Irradiation on the Microstructure and Magnetic Properties of Ni Si3 N4 Multilayers

AuthID
 P-00F-RRJ
4
Author(s)
Prieto, C
·
Traverse, A
·
Ramirez, R
Tipo de Documento
Article
Year published
2005
Publicado
in Journal of Applied Physics, ISSN: 0021-8979
Volume: 98, Número: 11, Páginas: 113507
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Publication Identifiers
SCOPUS: 2-s2.0-29144462593
Source Identifiers
ISSN: 0021-8979
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