Fermi Level Dependence of the Ambipolar Diffusion Length in Amorphous Silicon Thin Film Transistors

AuthID
P-00F-RV3
3
Author(s)
Wang, F
·
Reissner, M
Tipo de Documento
Article
Year published
1993
Publicado
in Applied Physics Letters, ISSN: 0003-6951
Volume: 63, Número: 8, Páginas: 1083-1085
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Publication Identifiers
SCOPUS: 2-s2.0-3042777125
Source Identifiers
ISSN: 0003-6951
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