In Situ X-Ray Diffraction Studies Concerning the Influence of Al Concentration on the Texture Development During Sputter Deposition of Ti-Al-N Thin Films

AuthID
 P-00F-RVY
5
Author(s)
Beckers, M
·
Mucklich, A
·
Moller, W
Tipo de Documento
Article
Year published
2005
Publicado
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, ISSN: 0734-2101
Volume: 23, Número: 5, Páginas: 1384-1391 (8)
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Publication Identifiers
SCOPUS: 2-s2.0-31144457848
Wos: WOS:000232130400019
Source Identifiers
ISSN: 0734-2101
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