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Influence Of The Target/Shield Distance On The Coatings Deposition By Rf Magnetron Sputtering

AuthID
P-001-JJV

Author(s)

FILIPE, N

CAVALEIRO, A

VIEIRA, MT

Tipo de Documento

Article

Year published

1994

Publicado

in VACUUM, ISSN: 0042-207X

Volume: 45, Número: 10-11, Páginas: 1099-1100 (2)

Conference

1St European Topical Conference on Hard Coatings (Etchc-1)/2Nd Iberian Vacuum Meeting (Ii Riva), Date: JUL 12-15, 1993, Location: ALICANTE, SPAIN

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Publication Identifiers

DOI: 10.1016/0042-207x(94)90033-7

SCOPUS: 2-s2.0-0028518424

Wos: WOS:A1994PH23600033

Source Identifiers

ISSN: 0042-207X

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Influence Of The Target/Shield Distance On The Coatings Deposition By Rf Magnetron Sputtering

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