Tungsten Doped Vanadium Dioxide Thin Films Prepared by Atmospheric Pressure Chemical Vapour Deposition from Vanadyl Acetylacetonate and Tungsten Hexachloride

AuthID
 P-00F-TB0
3
Author(s)
Binions, R
·
Parkin, IP
Tipo de Documento
Article
Year published
2007
Publicado
in SURFACE & COATINGS TECHNOLOGY, ISSN: 0257-8972
Volume: 201, Número: 22-23, Páginas: 9369-9372 (4)
Conference
16Th European Conference on Chemical Vapor Deposition, Date: SEP 16-21, 2007, Location: Hague, NETHERLANDS
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Publication Identifiers
SCOPUS: 2-s2.0-34547662518
Wos: WOS:000249340400109
Source Identifiers
ISSN: 0257-8972
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