Effect of the Barrier Thickness on Interface Defect Density in Amorphous-Si:h/Amorphous-Si1-Xcx:h Multilayers

AuthID
 P-00F-VKM
3
Author(s)
Wang, F
·
Fischer, T
·
Tipo de Documento
Article
Year published
1994
Publicado
in Applied Physics Letters, ISSN: 0003-6951
Volume: 65, Número: 22, Páginas: 2798-2800
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Publication Identifiers
SCOPUS: 2-s2.0-5844239571
Source Identifiers
ISSN: 0003-6951
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