Dependence of Ga-Doped Zno Thin Film Properties on Different Sputtering Process Parameters: Substrate Temperature, Sputtering Pressure and Bias Voltage

AuthID
 P-00G-3PS
2
Author(s)
Tipo de Documento
Article
Year published
2015
Publicado
in THIN SOLID FILMS, ISSN: 0040-6090
Volume: 586, Páginas: 13-21 (9)
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Publication Identifiers
SCOPUS: 2-s2.0-84928983064
Wos: WOS:000353984000003
Source Identifiers
ISSN: 0040-6090
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