Publicações

Low Filament Temperature Deposition Of A-Si-H By Catalytic Chemical-Vapor-Deposition

AuthID
P-001-NFM

Author(s)

BROGUEIRA, P

GREBNER, S

WANG, F

SCHWARZ, R

CHU, V

CONDE, JP

Editor(es)

Schiff, EA; Thompson, MJ; Madan, A; Tanaka, K; LeComber, PG

Tipo de Documento

Proceedings Paper

Year published

1993

Publicado

in AMORPHOUS SILICON TECHNOLOGY-1993 in Materials Research Society Symposium Proceedings, ISSN: 0272-9172

Volume: 297, Páginas: 121-126 (6)

Conference

Symposium on Amorphous Silicon Technology, at the 1993 Mrs Spring Meeting of the Materials-Research-Society, Date: APR 13-16, 1993, Location: SAN FRANCISCO, CA, Patrocinadores: MAT RES SOC, ELECT POWER INST, ELETTRORAVA SPA, ENTE NAZL ENERGIA ATOM, XEROX CORP, KERNFORSCHUNGSANLAGE, SOLAREX CORP, ADV PHOTOVOLTAIC SYSTS, USSC

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