Turning Periodic Mesoporous Organosilicas Selective to Co2/Ch4 Separation: Deposition of Aluminium Oxide by Atomic Layer Deposition

AuthID
 P-00G-WKQ
9
Author(s)
Lourenço, MAO
·
Silva, RM
·
Silva, RF
·
Pinna, N
·
Pronier, S
·
Tipo de Documento
Article
Year published
2015
Publicado
in Journal of Materials Chemistry A, ISSN: 2050-7488
Volume: 3, Número: 45, Páginas: 22860-22867
Indexing
Scopus®
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Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-84946903169
Source Identifiers
ISSN: 2050-7488
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