Investigations of Titanium Oxide Films Deposited by D.c. Reactive Magnetron Sputtering in Different Sputtering Pressures

AuthID
 P-00H-65A
2
Author(s)
dos Santos, M
Tipo de Documento
Article
Year published
1993
Publicado
in Thin Solid Films, ISSN: 0040-6090
Volume: 226, Número: 1, Páginas: 22-29
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ISSN: 0040-6090
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